About
Dakota Mace (Diné) is an interdisciplinary artist who focuses on translating the language of Diné history and beliefs. Mace received her MA and MFA degrees in Photography and Textile Design at the University of Wisconsin-Madison and her BFA in Photography from the Institute of American Indian Arts. As a Diné (Navajo) artist, her work draws from the history of her Diné heritage, exploring the themes of family lineage, community, and identity. In addition, her work pushes the viewer's understanding of Diné culture through alternative photography techniques, weaving, beadwork, and papermaking.
She has also worked with numerous institutions and programs to develop dialogue on cultural appropriation and the importance of Indigenous design work. She is an MFA in Studio Arts Faculty member at the Institute of American Indian Arts and the photographer for the Helen Louise Allen Textile Center and the Center of Design and Material Culture.
Her work is in the collections of the Library of Congress, Forge Project Collection, Whitney Museum of American Art, Everson Museum of Art, Amon Carter Museum, National Gallery of Art, Museum of Contemporary Photography among other public collections.
She is represented by Bruce Silverstein Gallery in New York City.